ULTIMATE REPAIR RENEWAL HAIR MASK
ULTIMATE REPAIR RENEWAL HAIR MASK
REF STOCKHOLM
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REF Ultimate Remair mask is an intensive renewal and nourishment with specially selected plant extracts and active ingredients. A new improvement with the latest advanced technology and a richer formula with less water. Protects, strengthens and restores dry, damaged hair from chemical or thermal use.
Fortifying Quinoa Protein: An extra concentration of Fortifying Quinoa Protein provides hair with a broad distribution of essential amino acids for long-lasting restoration.
Organic Murumuru Butter: Derived from the Murumuru nut and known for its highly moisturizing properties. It creates an impermeable barrier that prevents moisture loss and locks in amino acids for long-lasting repair.
Ceramide 2: Ceramide 2, a natural molecule that binds and locks in moisture in the hair. Protects hair fibers and improves their durability.
Anti-breakage system: Natural molecules and organic butter form the basis of this specially formulated conditioning technology. Provides hair with a soothing agent and envelops each strand with a protective shield. Protect the cuticle
Color Retention System: Our color retention system is an excellent combination of natural ingredients combined with the latest advanced technology.
Without sulfates and parabens. A product suitable for vegans.
How to use: Apply the required amount to damp hair. Leave for 5-15 minutes and rinse. It is recommended to use REF conditioner after rinsing. Use 1-2 times a week.
For best results, use other products in this series as well.
The composition:
Aqua, Cetearyl Alcohol, Cetyl Alcohol, Glycerin, Behentrimonium Chloride, Dimethicone, Cetrimonium Chloride, Quaternium-91, Hydrolyzed Wheat Protein PG-Propyl Silanetriol, Propanediol, Astrocaryum Murumuru Seed Butter, Dipropylene Glycol, Bis-Cetearyl Amodimethicone, Cetrimonium Methosulfate, Quaternium-91 95, PEG-8, Lactic Acid, Helianthus Annuus Seed Extract, Chenopodium Quinoa Seed Extract, Tocopherol, PEG-8/SMDI Copolymer, Palmitoyl Myristyl Serinate, Sodium Polyacrylate, Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate, Butylene Glycol, Ethylhexylglycerin, Phenoxyethanol, Potassium Sorbate, Sodium Benzoate, Sorbic Acid, Parfum, Benzyl Salicylate
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Maska ir intensīvi barojoša procedūra, kas paredzēta rekonstrukcijai un dziļai atjaunošanai ļoti bojātiem un novājinātiem matiem. Tā darbojas ar augstu kvinojas proteīna un citu eļļu koncentrāciju, lai palīdzētu aizpildīt bojāto matu šķiedru vietas.